Cooling device with micro cooling fin

ABSTRACT

A cooling device with micro cooling fins is provided. The cooling device includes a substrate, a plurality of vibrating type cooling fins extending from the substrate, and a blast fan for ventilating the substrate to cool the substrate and the vibrating type cooling fins and for causing the vibrating type cooling fins to vibrate. Accordingly, micro cooling fins formed on the surface of a substrate change the flowing path of the air and improve the performance of heat transfer near the surface of the substrate due to their vibration. In other words, the resistance to heat transfer is decreased and the performance of heat transfer is improved by disturbing the formation of a heat boundary layer, which is formed on a smooth surface. Since the cooling device provides improved heat transfer performance compared to an existing cooling device, an area and volume for heat transfer can be decreased so that the cooling device can be miniaturized.

This application is a continuation of U.S. application Ser. No.09/702,859, filed on Nov. 1, 2000 now U.S. Pat. No. 6,334,480.

BACKGROUND OF THE INVENTION

1. Field of the Invention

The present invention relates to a cooling device having a micro coolingfin, and more particularly, to a cooling device having a micro coolingfin employing a Micro ElectroMechanical System (MEMS).

2. Description of the Related Art

In conventional cooling devices for electronic equipment and parts, aplurality of cooling fins are installed in a single base, and a blastfan for forcibly inducing the flow of the air when necessary isintegrated into a cooling device. For example, a heat releasing devicefor cooling the CPU of a computer includes a plurality of cooling fins 2on a single base 1 and a cooling fan 3 for generating an air flow withrespect to the cooling fins 2, as shown in FIG. 1. Such a cooling deviceemploying a forced air flow method forcibly makes the air surroundingfins flow to release heat from the cooling fins, as shown in FIG. 2.

However, in such a conventional cooling device, cooling fins are fixed,and their surfaces are smooth, so a significantly thick heat boundarylayer 4 is spontaneously formed on a cooling fin when the air flowsalong the smooth surface of the cooling fin, as shown in FIG. 3. As aresult, heat cannot be effectively released from the cooling fin 2. Thisis because an air space 5 accumulated in a heat boundary layer serves toresist heat transfer so as to inhibit heat from being released from thesurface of the cooling fin 2. Thermal resistance within the accumulatedair space 5 increases as distance from the surface of the cooling fin 2decreases. The air space 5 is motionless on the surface of the coolingfin 2, so only heat transfer due to diffusion effects occurs, and thereis not convection. As shown in FIG. 3, the air is forcibly made to flowtoward the cooling fin 2 by the blast fan 3 at a speed of V₀. In aportion distance from the accumulated heat boundary layer 4 on thecooling fin 2, the air flows at a speed of about V₀, but the air flowsat a speed of about V₁ which is less than V₀ when it passes through theheat boundary layer 4. The air flows at a speed of V₂ which is less thanV₁ in the underlying accumulated air space 5. The flow of the airactually halts on the surface of the cooling fin 2. The halt of the airflow is due to friction and viscous force working between the air andthe cooling fin 2, in view of aerodynamics. Accordingly, a large coolingfin is required to release a large amount of heat. However, as the sizeof a cooling fin increases, the surface area of the cooling fin andthermal resistance increase. So, the size of a cooling device is larger,and a heat transfer rate per unit volume decreases. This goes againstthe trend of miniaturizing parts, for example, the parts of a computer.

SUMMARY OF THE INVENTION

To solve the above problems, it is a first object of the presentinvention to provide a cooling device with a micro cooling fin having anefficient heat releasing structure.

It is a second object of the present invention to provide a coolingdevice with its a micro cooling fin, which has a high efficiency of heatrelease and a small size.

Accordingly, to achieve the above objects of the invention, in oneembodiment, there is provided a cooling device with a micro cooling fin.The cooling device includes a substrate, and a plurality of vibratingtype cooling fins extending from the substrate.

In another embodiment, there is provided a cooling device with a microcooling fin, including a substrate, a plurality of vibrating typecooling fins extending from the substrate, and a blast fan forventilating the substrate to cool the substrate and the vibrating typecooling fins and for causing the vibrating type cooling fins to vibrate.

In a cooling device according to the present invention, the substrate ispreferably a semiconductor substrate. It is preferable that each of thevibrating type cooling fins extends in parallel to the surface of thesubstrate, and a hollow portion is provided below each vibrating typecooling fin.

Meanwhile, it is preferable to install the blast fan such that the aircan be sent to the substrate at a predetermined angle with respect tothe level of the substrate.

It is preferable to allow each of the vibrating type cooling fins tohave a resonance frequency corresponding to a flow rate given by theblast fan so that the vibrating type cooling fins resonate in responseto the flowing air generated by the blast fan.

It is preferable to form a coating layer for giving stress to thesurface of each of the vibrating type cooling fins on the surface of thevibrating type cooling fins.

BRIEF DESCRIPTION OF THE DRAWINGS

The above objectives and advantages of the present invention will becomemore apparent by describing in detail preferred embodiments thereof withreference to the attached drawings in which:

FIG. 1 is a perspective view illustrating an example of a conventionalcooling device;

FIG. 2 is a side view illustrating the flow of air in the cooling deviceof FIG. 1;

FIG. 3 is a view illustrating a structure in which a heat boundary layerand accumulated air space are formed around a cooling fin depending onthe flow of air;

FIG. 4 is a perspective view illustrating the structure of a coolingdevice according to a first embodiment of the present invention;

FIG. 5 is a partial sectional view illustrating the structure of acooling device according to the first embodiment of the presentinvention;

FIGS. 6A through 8 are views illustrating the manufacturing processes ofa cooling device according to the present invention;

FIG. 9 is a side view illustrating the operating structure of a coolingfin in a cooling device according to the first embodiment of the presentinvention.

FIG. 10 is a side view illustrating the flow of air in a cooling deviceaccording to a second embodiment of the present invention,

FIG. 11 is a side view illustrating the flow of air in a cooling deviceaccording to a third embodiment of the present invention;

FIG. 12 is a side view illustrating the flow of air in a cooling deviceaccording to a fourth embodiment of the present invention: and

FIG. 13 is a photograph of the substrate of a cooling devicemanufactured using a Micro ElectroMechanical System (MEMS) according tothe present invention.

DETAILED DESCRIPTION OF THE PRESENT INVENTION

Referring to FIG. 4, a plurality of grooves 11 having a predetermineddepth are formed on a substrate 10. A cooling fin 12 of a cantilevertype is formed in the opening portion of each of the grooves 11 suchthat it extends from the edge of the opening portion of the groove 11.

The substrate 10 is a semiconductor substrate and is integrated with thecooling fin 12. Here, in order to allow the cooling fin 12 to resist theflow of the air, it is preferable to make the surface of the cooling fin12 level with the surface of the substrate 10, or to make the extendingend of the cooling fin 12 have a predetermined height from the surfaceof the substrate 10 so that the end of the cooling fin 12 is exposed.

The cooling fin 12 is formed using a Micro ElectroMechanical System(MEMS) technique. Referring to FIG. 5, the groove 11 has slantedsidewalls 13, and the cooling fin 12 is spaced from the bottom of thegroove 11.

A method of forming a cooling fin 12 is as follows.

As shown in FIG. 6A, the surface of a substrate 10 formed of asemiconductor wafer is doped with, for example, boron, in apredetermined pattern. In FIGS. 6A and 6B, a reference character Bdenotes an area doped with boron for preventing or stopping etching, anda reference character A denotes an undoped area.

As shown in FIG. 7, an undoped area is etched to a predetermined depthby performing an anisotropic etching process using an etchant having ahigher etching rate with respect to the undoped area than with respectto the doped area, thereby forming a groove 11 and a cooling fin 12disposed at the center of the groove 11.

As shown in FIG. 8, a coating layer 12 a is formed on the surface of thesubstrate, in particular, on the surface of the cooling fin 12. Thecoating layer 12 a gives appropriate stress to the cooling fin 12derived from the semiconductor wafer. thereby preventing the cooling fin12 from drooping down to the bottom of the groove 11 and, furthermore,curving the cooling fin 12 such that the end of the cooling fin 12directs upward.

The coating layer 12 a may be formed by deposition of special metal ornonmetal or, as described above, a doping or growth method for givingappropriate stress to the cooling fin 12.

FIG. 9 illustrates a state in which the cooling fin 12 vibrates due to aflow of air into the substrate 10. Here, the vibration of the coolingfin 12 disturbs a boundary layer, i.e., accumulated air space and a heatboundary layer, formed around the cooling fin 12 so that the accumulatedair space and the heat boundary layer become much thinner or are broken.Accordingly, heat concentrated on the substrate 10 and the cooling fin12 is easily exposed to flowing air space so that heat can beeffectively released. Here, the cooling fin 12 can be made to vibratemore effectively by adjusting the characteristic frequency of thecooling fin 12 to be suitable for the flow rate of the air.

FIG. 10 illustrates a state in which a blast fan 30 is disposed to beparallel to the surface of a substrate 10. FIG. 11 illustrates astructure in which a blast fan 30 is disposed to be slanted with respectto the surface of a substrate 10 at a predetermined angle.

In such structures, the substrate 10 may be formed directly on thesurface of a heating source, for example, a semiconductor device, or maybe formed on the surface of an external mold packaging a semiconductordevice.

FIG. 12 illustrates a cooling device prepared for being mounted on acentral processing unit (CPU) 50 of a computer, according to anembodiment of the present invention. A substrate 10 is bonded to a base40 formed of metal such as copper or aluminum which has excellent heatconductivity. A blast fan 30 is disposed above the substrate 10, spacedfrom the substrate 10 by a predetermined distance by a spacer 31. Thebase 40 is bonded to the surface of the CPU 50 with a thermohardeningsilicon adhesive or a separate coupling member.

FIG. 13 is a photograph of the substrate of a cooling devicemanufactured using a MEMS according to the present invention.

According to the present invention, a micro cooling fin formed on thesurface of a substrate changes the flowing path of the air and improvesthe performance of heat transfer near the surface of the substrate dueto its vibration. In other words, the present invention decreases theresistance to heat transfer and improves the performance of heattransfer by disturbing the formation of a heat boundary layer, which isformed on a smooth surface. Since a cooling device according to thepresent invention provides improved heat transfer performance comparedto an existing cooling device, an area and volume for heat transfer canbe decreased so that the cooling device can be miniaturized.

Although the invention has been described with reference to particularembodiments, it will be apparent to one of ordinary skill in the artthat modifications to the described embodiments may be made withoutdeparting from the spirit and scope of the invention. Therefore, thescope of the invention will be defined by the appended claims.

What is claimed is:
 1. A method of making a micro cooling devicecomprising the steps of: obtaining a substrate with a top surface;doping the top surface in a predetermined pattern, such that thepredetermined pattern facilitates the forming of cooling fins andgrooves, etching the undoped surface to a predetermined depth, forminggrooves and coating the doped surface with a material that providestension on a top surface of the cooling fins.
 2. A method of making amicro cooling device in accordance with claim 1, wherein thepredetermined pattern defines a doped area with a plurality of closedperimeter lines with a predetermined thickness and within each of theplurality of closed perimeter lines is defined at least one of thecooling fins wherein one edge of the at least one cooling fin contactsthe respective closed perimeter line.
 3. A method of making a microcooling device in accordance with claim 1, wherein the step of etchingis performed with an anisotropic etching process using an etchant havinga higher etching rate with respect to the undoped area than with respectto the doped area.
 4. A method of making a micro cooling device inaccordance with claim 1, wherein the step of coating the doped surfaceincludes deposition of a metal.